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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
276
Mots-clés
Bixbyite
Nanotubes
Spectroscopic ellipsometry
Thin films
AZO thin films
A-CNx
Vanadium Sesquioxide
Aryl-diazonium salts
BOMBARDMENT
Bipolar resistive switching BRS
Atomic layer etching
A Multilayers
B1 Inorganic compounds
V2O3
XPS
A Chalcogenides
Magnetron sputtering
PECVD
Sol-gel
Anatase
Ambipolar material
Carbon
Capacitance
Carbon nanotubes
Chemical and biological sensors
TiO2
Scanning electron microscopy
B3 Solar cells
Biofilms microbiens
X-ray photoelectron spectroscopy
Cathepsin
B Chemical synthesis
Residual stress
Chalcogenide glass
Physical vapor deposition
Calcined clay
Non-volatile memory
Selenization
Alloying
Copper
Ablation laser
Adsorption
Carbon Nanotube
CaTiO3Pr^3^+
Plasmas froids
A3 Physical vapor deposition processes
Etching
Functionalization
Semiconductors
B2 Semiconducting indium compounds
Biocapteurs
Mott insulators
Buffer Couple
Transmission electron microscopy
AuCu alloy
TEM
CH4
Titanium dioxide
Applications industrielles
SF 6
Atomic force microscopy
Films
Amorphous
Band alignment
A Thin films
Optical properties
CHLORINE PLASMAS
AlN
Low-pressure plasma processing
Thin film
B2 Quaternary
CIGSe
Colloidal solution
B2 Semiconducting alloys
Oxides
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Band gap
NEXAFS
Chemical detection
X-ray diffraction
Amyloid precursor
Mott insulator
C Photoelectron spectroscopy
Aluminium nitride
Avalanche breakdown
Carbon nitride
Kirkendall effect
Biomasse
A1 Characterization
Plasma etching
Alzheimer's disease
Transfert d'énergie
Resistive switching
3 nm in size
Nanocomposite
Sputtering
Chalcogenide
CNTs’ collapse
Chalcogenides
Structure